A review of microplasma technologies developed and commercialized by the Laboratory for Optical Physics and Engineering at the University of Illinois at Urbana Champaign.
Front cover: 100 mm x 100 mm industrial grade VUV exposure system by Cygnus Photonics.
Cellulose acetate (CA) and cellulose acetate butyrate (CAB) exhibit a linear ablation rate when photoetched by 172 nm radiation. Complex 3D CA and CAB micro- and nanostructures may be used as disposable optical elements, microfluidic devices, and molds for PDMS curing. No chemicals are needed for 3D-micromachining CA and CAB!
α-line is a universal manual align and exposure system, extending the practicality of aligners beyond microelectronics and traditional photoresists. Utilizing exclusive technologies, direct imaging on PMMA, ABS, and other organic polymers is now possible, making α-line ideal for the needs of MEMS, bioengineering, and life sciences.
High resolution (<400 nm) photolithographic technique and precise photoablation of polymers has been demonstrated using 172 nm exposure tools manufactured by Cygnus Photonics.
Cygnus Photonics attends Photonics West 2020 conference and exhibits photopatterning tools.
Cygnus Photonics introduces a novel 172 nm exposure system that fits in the palm of your hand!