α-Line

α-Line

Universal Manual Alignment System
High Resolition Photolithography Simplified
Using a clean-slate design and minimalist approach, the α-line redefines the performance expectations of affordable manual contact aligners. Leveraging modern components with Cygnus Photonic’s state of the art π-Photon 172nm exposure source, α-line simplifies traditional high resolution photo-imaging and introduces new processing capabilities not possible with existing alignment systems. α-line is a universal manual align and exposure system, extending the practicality of aligners beyond microelectronics and traditional photoresists. Utilizing exclusive technologies, direct imaging on PMMA, ABS, and other organic polymers is now possible, making α-line ideal for the needs of MEMS, bioengineering, and life sciences.
images

    Applications

  • Conventional photolithography
  • Direct polymer imaging/photoablation
  • Micro- and Nanofluidics
  • Optical Components
  • Patterned surface energy modification
  • Selective surface functionalization

    Features

  • High resolution alignment and exposure system in a rugged and small-footprint package
  • Back-to-basics design focused on accuracy, stability, and simplicity of operation
  • Extended range of photochemistries and substrate materials breaks through limitations of traditional photolithography
  • Consistent, high quality results for all operator skill-levels
  • Photolithography anywhere. Low power and available options for stand-alone operation
  • Set-up and forget. Robust mechanical and optical components provide for extended maintenance and calibration intervals
  • Relevant technical fields: semiconductors, microfluidics, bio-assays, optics, and more
Sample/Substrate
  Maximum size:
  Minimum size:
  Maximum mask+sample thickness:
50 mm × 50 mm (2” × 2”)
10 mm × 10 mm (0.4” × 0.4”)
8 mm
Mask size 75 mm × 75 mm (3” × 3”)
custom size (optional)
Sample Alignment
  Travel Range
        X,Y:
        Theta:
  Resolution
        X,Y:
        Theta:

± 6 mm
± 10° (coarse), ± 3° (Fine)

< 1.5 μm (< 0.5 μm optional)
2 × 10-4 °
Power requirements
  Voltage:

  Power consumption:
12 VDC, 110/220 V AC
(12 VDC adapter included)
< 20 W
Utilities
  Vacuum (optional):
  Compressed air (optional):
< -0.2 bar
> 1.1 bar
Exposure mode: Soft contact, hard contact
Physical dimensions
  Width:
  Depth:
  Height:
  205 mm (8”)
  230 mm (9”)
  400 mm (15.5”)
Weight: < 12 kg (26.5 lb)
Exposure Wavelengths
(requires π-Photon, sold separately):		 172 nm, 222 nm, 308 nm

* Dry nitrogen or Ar purging is required for operation

** UV-grade fused silica transmission spectrum must be verified by manufacturer