Blog

A review of microplasma technologies developed and commercialized by the Laboratory for Optical Physics and Engineering at the University of Illinois at Urbana Champaign...

Cellulose acetate (CA) and cellulose acetate butyrate (CAB) exhibit a linear ablation rate when photoetched by 172 nm radiation...

α-line is a universal manual align and exposure system, extending the practicality of aligners beyond microelectronics and traditional photoresists...

High resolution (<400 nm) photolithographic technique and precise photoablation of polymers has been demonstrated using 172 nm exposure tools manufactured by Cygnus Photonics...

Cygnus Photonics attends Photonics West 2020 conference and exhibits photopatterning tools...

Cygnus Photonics introduces a novel 172 nm exposure system that fits in the palm of your hand...