Using a clean-slate design and minimalist approach, the α-line redefines the performance expectations of affordable manual contact aligners. Leveraging modern components with Cygnus Photonic’s state of the art π-Photon 172nm exposure source, α-line simplifies traditional high resolution photo-imaging and introduces new processing capabilities not possible with existing alignment systems.
α-line is a universal manual align and exposure system, extending the practicality of aligners beyond microelectronics and traditional photoresists. Utilizing exclusive technologies, direct imaging on PMMA, ABS, and other organic polymers is now possible, making α-line ideal for the needs of MEMS, bioengineering, and life sciences.
Sample/Substrate   Maximum size:   Minimum size:   Maximum mask+sample thickness: |
50 mm × 50 mm (2” × 2”) 10 mm × 10 mm (0.4” × 0.4”) 8 mm |
Mask size | 75 mm × 75 mm (3” × 3”) custom size (optional) |
Sample Alignment   Travel Range         X,Y:         Theta:   Resolution         X,Y:         Theta: |
± 6 mm ± 10° (coarse), ± 3° (Fine) < 1.5 μm (< 0.5 μm optional) 2 × 10-4 ° |
Power requirements   Voltage:   Power consumption: |
12 VDC, 110/220 V AC (12 VDC adapter included) < 20 W |
Utilities Vacuum (optional): Compressed air (optional): |
< -0.2 bar > 1.1 bar |
Exposure mode: | Soft contact, hard contact |
Physical dimensions   Width:   Depth:   Height: |
  205 mm (8”)   230 mm (9”)   400 mm (15.5”) |
Weight: | < 12 kg (26.5 lb) |
Exposure Wavelengths (requires π-Photon, sold separately): |
172 nm, 222 nm, 308 nm |
* Dry nitrogen or Ar purging is required for operation
** UV-grade fused silica transmission spectrum must be verified by manufacturer