A Universal Compact Exposure System, Pi - Photon, fits in the palm of your hand and is designed to be used standalone or with additional modules.

• Turnkey system
• Surface cleaning and functionalization in minutes (great alternative to oxygen plasma treatment)
• Fast and efficient removal of polymer and other organic materials
• Low power consumption (15 W), no cooling required
• Available emission wavelengths: 172 nm, 222 nm, and 308 nm
• Open aperture: 42 × 42 mm (1.65" × 1.65")
• Long lifetime: > 2000 hrs

Robust light engine for industrial applications.

• Low power consumption (<50 W)
• Available emission wavelengths: 172 nm, 222 nm, and 308 nm
• Highest intensity in its class: >20 mW/cm² (at 172 nm)
• Open aperture: 92 × 92 mm (3.62)" × 3.62")
• Long lifetime: > 2000 hrs
• Uniform intensity profile
• Easily integrable into existing systems

Modular Sub-Micron Patterning, Photolithographic, and Flood Exposure System

• Photopatterning outside of a clean room
• Produce micrometer-size features in polymers in minutes
• Hydrophilic/hydrophobic patterning of surfaces
• Demonstration of photolithographic processes without toxic chemichals
• Fast and affordable prototyping of optical components and nano- and microfluidics

Universal Manual Alignment System.

• Applications: Multi-layer Photolithography, Microfluidics, Polymer optics
• No utilities required to operate
• 1 µm accuracy