A Universal Compact Exposure System, π - Photon, fits in the palm of your hand and is designed to be used standalone or with additional modules. Available emission wavelengths: 172 nm, 222 nm, and 308 nm. Open aperture: 42 × 42 mm (1.65" × 1.65").
Photolithography and Patterning
Modular Sub-Micron Patterning, Photolithographic, and Flood Exposure System
Universal Manual Alignment System Applications: Multi-layer Photolithography, Microfluidics, Polymer optics