Optical microscope image of a 50 nm PMMA film on a Si substrate, patterned by the π²-Cygni system.

Scanning electron micrograph (SEM) of a 50 nm-thick PMMA film on Si, patterned with the π²-Cygni system.

Rectangular silicon pillars fabricated by the Cygnus π-Photon exposure tool. After 1 μm x 1 μm openings were produced in 50 nm thick PMMA films, the pillars were produced by a reactive-ion etching process in which an aluminum film served as a mask.

SEM of gold lines formed on Si by electroplating the surface through openings in a PMMA film produced by the π²-Cygni system.

Gold lines formed on Si by electroplating. π²-Cygni system patterned a PMMA film which served as a mask for the electroplating process.

500 nm-diameter aluminum discs fabricated on Si with the π-Photon exposure tool and a liftoff process in which a 50 nm-thick PMMA film served as the photoresist.

3D nanostructure (recorded with a laser profilometer) produced in acrylic (PMMA) by a double exposure with the π²-Cygni photolithographic tool. The time for each exposure step was 1 minute and the diagram is not to scale.

3D nanostructure (recorded with a laser profilimeter) produced in acrylic (PMMA) by a double exposure with the π²-Cygni photolithographic tool. The diagram is not to scale.

Optical image of an array of 500 nm-diameter and 200 nm-deep cylindrical holes photoetched in bulk acrylic (PMMA) sheet with the π-Photon exposure tool.

Patterning of a bulk acrylic surface with the π²-Cygni photolithographic system.