α-line is a universal manual align and exposure system, extending the practicality of aligners beyond microelectronics and traditional photoresists. Utilizing exclusive technologies, direct imaging on PMMA, ABS, and other organic polymers is now possible, making α-line ideal for the needs of MEMS, bioengineering, and life sciences.
High resolution (<400 nm) photolithographic technique and precise photoablation of polymers has been demonstrated using 172 nm exposure tools manufactured by Cygnus Photonics.
Cygnus Photonics attends Photonics West 2020 conference and exhibits photopatterning tools.
Cygnus Photonics introduces a novel 172 nm exposure system that fits in the palm of your hand!